Published in Uncategorized - -

HIGH RESOLUTION DEMO STRUCTURE FABRICATED IN THE SILICON PHOTONICS TECHNOLOGY PLATFORM

In the frame of the 5G communications platform development, within the Silicon Photonics technology setup and optimization, as a demonstration of the fabrication capabilities, a resolution structure has been defined by electron beam lithography down to 55nm width at a 6″ wafer scale. For more information contact anottola@cnit.it

dose_200_linea_100_nm_02

Leave a Reply

Your email address will not be published. Required fields are marked *